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Canon Patent Application: Curved Sensor manufacturing
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Canon Patent Application: Curved Sensor manufacturing

In this patent application, Canon is attempting to patent a method of manufacturing for a curved sensor.

In the main description, Canon is generically describing curving a semiconductor with two layers (ie: what we call stacked).  Later on in the description, what this semiconductor becomes clearer as Canon states;

 In this specification, the upper main surface in FIG. 1B is referred to as a front surface 39, and the lower main surface opposite to the surface 39 is referred to as a back surface 40. In the present embodiment, the semiconductor element 11 is disposed on the surface 39 side of the semiconductor substrate 10. In addition, a color filter CF and a microlens ML are disposed on the semiconductor element 11. For example, the semiconductor element 11 may be a photoelectric conversion element such as a photodiode formed on the semiconductor substrate 10. Further, a semiconductor element such as a transistor for taking out a signal converted from light by the photoelectric conversion element may be disposed on the back surface 40 side of the semiconductor element 11 which is a photoelectric conversion element in the semiconductor substrate 10. That is, the semiconductor substrate 10 including the semiconductor element 11 may be a so-called back-illuminated imaging element. 

From this we see that Canon is looking at a BSI stacked sensor that curves.

Canon does go on to state, but really for the protection of the patent more than anything (because the applications where you'd curve a semiconductor are pretty rare);

However, the semiconductor device 1 is not limited to the imaging device

The rest of the patent goes through the process on how Canon is warping (or curving the sensor), essentially they are using a resin that expands as it cures, to deform the sensor.

 

 

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How to view Japan Patent applications.

Unfortunately, there's no direct way of linking to the patent application (sad!) however, this is the easiest process to view a japan patent or application.

  1. Go to the Japan Patent Office search page.
  2. If it's a patent application (they are usually in the format of Year-Number ie: 2017-011300) then type the patent application number into the second field down from the top where it says publication of patent application. 
  3. Click on search.
  4. Then click on the patent application number link, and there's the patent application!

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